Wet Sonic Cleaning & Ultrasonic Cleaning
Pretech Co Ltd. Manufactures a wide range of ultrasonic cleaning devices which range from single wafer cleaning to complete batch process automated wafer cleaning systems. The Pretech range of cleaning devices are listed as follows:
- Fine Sonic batch processing cleaner with frequency of 800 kHz. Suitable for cleaning Si wafers, photomask and magnetic disks.
- Fine Jet single wafer cleaning device with frequency of 1.5 MHz or 3.0 MHz. Suitable for cleaning Si wafers, photomask, LCD glass and magnetic disks.
- Fine Squall single wafer cleaning device with frequency of 1.5 MHz. Suitable for high throughput single wafer cleaning and large size glass substrate.
- Sweep Sonic batch processing cleaner with 28-200 KHz range. Suitable for Si wafers, magnetic disks, lenses and wafer cassettes.
- Complete automated custom wet process cleaning systems for Si wafers and magnetic disks.